Professor HaTaejoon ’s Research Team Develops an Oxide Memtransistor with Contact Engineering Applie
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- 2025-01-21
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on 2025.01.09 | Public Relations Team
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Professor Ha Taejoon (Department of Electronic Materials Engineering)’s
Research Team Develops an Oxide Memtransistor with Contact Engineering Applied
Enabling Neuromorphic Computing with High
Linearity and Precision
- Published in Small (IF: 13, JIF ranking: top
7%), a leading international journal in materials science -
Professor Ha Taejoon (Department of Electronic
Materials Engineering) and his research team, in collaboration with Professor
Kim Younghoon’s team from Sungkyunkwan University and Professor Park Sungkyu’s
team from Chung-Ang University, successfully developed an indium-gallium-zinc
oxide (IGZO)-based oxide memtransistor with contact engineering applied. This
breakthrough enabled the implementation of neuromorphic computing with high
linearity and precision. The results of this study were published in Small (IF:
13, JIF ranking: top 7%), a leading international journal in materials science
published by WILEY, under the title “Contact-Engineered Oxide Memtransistors
for Homeostasis-Based High-Linearity and Precision Neuromorphic Computing.”
(Reference: https://doi.org/10.1002/smll.202409510)
Recently, neuromorphic computing has garnered
significant global attention due to its numerous advantages, including
ultra-low power consumption, parallel processing, and environmental
adaptability. The discovery of Hebbian rules has advanced our understanding of
neural development and learning processes; however, it poses challenges for
neuromorphic system development as it cannot perfectly replicate learning
mechanisms. In response, Professor Ha Taejoon (Department of Electronic Materials
Engineering) and his research team, in collaboration with Professor Kim
Younghoon’s team from Sungkyunkwan University and Professor Park Sungkyu’s team
from Chung-Ang University, successfully developed an oxide semiconductor
memtransistor with contact engineering applied. This breakthrough enables the
device to replicate both Hebbian and homeo-plasticity mechanisms while
performing various memory functions. The fabricated IGZO memtransistor
demonstrated a high current switching ratio of over 104 and stable
operation even after 100 cycles of repetition. It also exhibited excellent
memory characteristics and achieved a high recognition accuracy of 91.77% for
numeric images through synaptic scaling adaptation, mimicking homeostasis.
Professor Ha Taejoon's research team has a
strong track record in oxide semiconductors and insulating materials, with over
40 SCI journal publications and more than 20 patents. Their work spans advanced
materials-based next-generation electronic device design and process development.
Contact-Engineered IGZO Memtransistor Device
Structure, Long-Term and Short-Term Memory Mimicry, and Image Recognition
Accuracy Analysis